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2017中国国际半导体技术大会（CSTIC）
时间：2017-03-12 08:00 至 2017-03-13 18:00
地点：上海
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2017中国国际半导体技术大会（CSTIC） 已过期
会议时间：2017-03-12 08:00至 2017-03-13 18:00结束 会议地点： 上海 上海国际会议中心 上海市浦东新区滨江大道2727号 会议规模：暂无 主办单位： SEMICON China |
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会议内容 主办方介绍
2017中国国际半导体技术大会（CSTIC）宣传图
中国国际半导体技术大会(CSTIC) 2017
China Semiconductor Technology International Conference (CSTIC) 2017
Plan now to participate at CSTIC 2017, one of the largest and the most comprehensive annual semiconductor technology conferences in China and Asia since 2000. Organized by SEMI and IEEE-EDS , co-organized by IMEC and ICMTIA(The Integrated circuit Materials Industry Technology Innovation Alliance), and co-sponsored by ECS, MRS and CEMIA(the China Electronics Materials Industry Association), CSTIC 2017 will be held March 12-13, 2017 in Shanghai, China, in conjunction with SEMICON China 2017. The conference will have ten symposia cover all aspects of semiconductor technology with focus on manufacturing and advanced technology, including detail manufacturing processes, devices design, integration, materials, and equipment, as well as emerging semiconductor technologies, circuit design, and silicon material applications. Hot topics, such as memory technology, 3D integration, MEMS and Photovoltaic Technology will also be addressed in the conference.
Date and Venue
March 12-13, 2017
Shanghai International Convention Center
上海国际会议中心 中国上海浦东滨江大道2727号
No.2727 Riverside Avenue Pudong, Shanghai 200120, China
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会议日程
（最终日程以会议现场为准）
| 08:45–09:30 | Opening Ceremony |
| Opening Remarks by Conference Chair | |
| Opening Remarks by SEMI | |
| Opening Remarks by IMEC | |
| Opening Remarks by Chinese Government Representatives | |
| Presentation of SEMI Best Student Paper Awards and SEMI Best Young Engineer | |
| Paper Awards | |
| Meeting Room | 3rd Floor Auditorium |
| 09:30 –10:10 | Prof.Hiroshi Amano |
| Nobel Laureate in Physics, 2014 | |
| Director, Center for Integrated Research of Future Electronics, Institute of Materials and Systems for Sustainability, Nagoya University | |
| 10:10–10:25 | Coffee Break |
| 10:25–11:05 | Dr.Tzu-Yin Chiu |
| CEO and Executive Director,Semiconductor Manufacturing International Corp.(SMIC) | |
| 11:05–11:35 | Dr.Jong Shik Yoon |
| Executive Vice President Foundry Business System-LSI,Samsung Electronics Co,LTD,Korea. | |
| 11:35–12:05 | Prof.Rao Tummala |
| Joseph.M Pettit Chair Professor in ECE and MSE Director, 3D Microsystems Packaging Research Center Georgia Research Alliance Eminent Scholar Georgia Institute of Technology, Atlanta, Ga, USA |
|
| 12:05–13:30 | 7th Floor Grand Ballroom 1 |
Panel Discussion
Sunday, March 12, 2017
Meeting Room: 3B
17:00-18:00
Moderator:
Panel Members:
Parallel Symposium Oral Sessions
| Sunday, March 12, 2017 | |
| 13:30 – 18:00 | Parallel Symposium Oral Sessions |
| Coffee Break | Conference Poster Session |
| Monday,March 13,2017 | |
| 8:00-18:00 | Parallel Symposium Oral Sessions |
Joint Sessions
Symposium II and Symposium III-Lithograpy/Etch joint session
Sunday, March 12, 2017
Shanghai International Convention Cente
Meeting Room: 3rd Floor Yellow River Hall黄河厅
Session Chairs: Kafai Lai (IBM) and Ying Zhang (Applied Material)
| 13:30-13:35 | Opening Remarks |
| Kafai Lai / Ying Zhang | |
| **13:35-14:05 | TBD |
| Donis Flagello, Nikon Research America | |
| **14:05-14:35 | Patterning Technology Inflections for the 10n and Beyond Logic Nodes |
| Rich Wise, Lam Research | |
| *14:35-14:55 | Development of 250W EUV light source for HConsiderations for pattern fidelity control towards 5nm nodeVM lithography |
| Hidetami Yaegashi, TEL | |
| *14:55-15:15 | The Insertion of extreme ultraviolet lithography (EUVL) from patterning perspective |
| Weimin Gao, Synopsys | |
| 15:15-15:30 | Coffee Break |
Symposium II and Symposium IX-DTCO Joint session
Monday, March 13, 2017
Shanghai International Convention Center
Meeting Room: 3rd Floor Yellow River Hall黄河厅
Session chairs: Leo Pang / Yiyu Shi
| *8:30-8:35 | Opening Remarks |
| Leo Pang / Yiyu Shi | |
| **8:35-9:05 | Design Technology Co-optimization for Disruptive Patterning Schemes |
| Puneet Gupta, UCLA | |
| **9:05-9:35 | TBD |
| Shaojun Wei, Tsinghua University | |
| *9:35-9:55 | TBD |
| Luigi Capodieci, Motovi.ai | |
| 9:55-10:10 | Coffee Break |
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会议嘉宾
（最终出席嘉宾以会议现场为准）
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朱志敏
布鲁尔科技有限公司
博士
王欣然
南京大学
教授
SangBum Kim
IBM
researcher
Dr. Qingtai Zhao
Forschungszentrum Julich
researcher
Min-hwa Chi
中芯国际
副总裁
参会指南
会议门票 场馆介绍
提前注册并付费 | 注册费 | |
听众 | 人民币 3,700 | 人民币 4,200 |
学生（持有效证件） | 人民币 2,100 | 人民币 2,600 |
晚宴（3月12日18:00-20:00） | 人民币 600 | 人民币 800 |
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上海国际会议中心
交通指南：
地铁二号线陆家嘴站、外滩观光隧道、583、621、623、776、778、870、872路、申高线、旅游江园线(滨江大道终点站)、82、85、581B、795路、陆家嘴环线（陆家嘴地铁站终点站）、81、797、983、旅游3号线、锦江观光巴士到东方明珠后步行5分钟即到。
上海国际会议中心地处陆家嘴金融贸易中心，毗邻东方明珠电视塔，与外滩万国建筑群隔江相望，交通设施方便快捷，地理位置得天独厚，于1999年8月落成并正式对外营业。总建筑面积11万平方米，作为上海标志性新景观，被评为建国五十年十大经典建筑之一。 上海国际会议中心素以举办大型国际会议、商务论坛而蜚声海内外。位于酒店7楼的上海厅可同时容纳3000人会议，是目前国内最大的无柱型多功能厅，28个大小不等、风格迥异的多功能会议厅，均备有最先进的高科技影音系统及同声传译设备。 内设五星级的，拥有273间景观豪华客房、风格迥异的餐厅设施以及丰富多样的娱乐与健身设施。
温馨提示
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